Abstract：Abstract: TiN hard film has been widely used for its many excellent properties in recent years. Several new preparation methods of TiN were introduced. The preparation mechanism and technological characteristics were also analyzed. Moreover, the development trend of the preparation methods for the TiN hard film was pointed out.
王洪涛，李 宏. TiN硬质薄膜制备技术的研究进展[J]. , 2016, 26(01): 60-63.
WANG Hong-tao, LI Hong. Research progress in preparation methods of TiN hard films. , 2016, 26(01): 60-63.
[1] 吴大维，硬质薄膜材料的最新发展及应用[J], 真空, 2003, (6) :1- 5[2] Taek-Soo Kim, Sang-Shik Park, Byong-Taek Lee. Characterization of nano-structured TiN thin films prepared by R. F. magnetron sputtering [J]. Materials Letters, 2005, 59: 3929- 3932.[3] Niyomsoan S,Grant W, Olson D L,et nl. Variation of color in titanium and zirconium nitride decorative thin films [J] Thin Solid Films, 2002, 415: 187- 194.[4] Sundgren J. E. Structure and properties of TiN coatings. [J]. Thin Solid Films, 1985, 128, 21-44.[5] Vishnyakov V M,Bachurin V I,Minnebaev K F,et nl. Ion assisted deposition of titanium chromium nitride [J]. Thin Solid Films, 2006, 497(1-2) ; 189-195.[6] Harish C. Barshilia, M. Surya Prakash et al. Structure hardness and thermal stability of TiAIN and nano- layered TiAIN/ GrN multillayer film [J]. Vacuum, 2005, 77:169- 179.[7] Han J G, Yoon J S, Kim H J, et al. High temperature wear resistance of (TiAl)N films synthesized by cathodic arc plasma deposition [J]. Surface and Coatings Technology,1996, (86-87):82-87[8] Schonjahn C , Bamford M, Donohue L A, et al. The interface between TiAlN hard coatings and steel substrates generated by high energetic Cr bombardment [J]. Surface and Coatings Technology, 2000, 125(1- 3) : 66-70[9] Stoiber M, Panzenbock M , Mitterer C, et al. Fatigue properties of Ti-based hard coatings deposited onto tool steels[J]. Surface and Coatings Technology, 2001, (142-144): 117-124[10] Motte P, Proust M, Torres J, et al. TiN-CVD process optimization for integration with Cu-CVD[J].Microelectronic Engineering, 2000, (50):369-374[11] Jimenez C, Gilles S, Bernard C, et al. Deposition of TiN thin films by organometallic chemical chemical vapor deposition: thermodynamical predictions and experimental results[J]. Surface and Coatings Technology, 1995(76-77):237-243[12] Harish C. Barshilia, M. Surya Prakash et al. Structure hardness and thermal stability of TiAIN and nano- layered TiAIN/ GrN multillayer film [J]. Vacuum, 2005, 77:169- 179.[13] Veprek S， Maritza J G， et al. Industrial applications of superhard nanooomposite coatings [J]. Surface & Coatings Technology, 2008, 202: 5063- 5073.[14] Rointan F. Bunshah. Handbook of hard coatings [M].2001: 60- 69.[15] 谢宏，切削刀具PVD涂层技术的发展及应用[J]. 硬质合金，2002(19)[16] Kelly P J, Arnell R D. Magnetron sputtering: a review of recent developments and applications [J]. Vacuum 2000, 56: 159- 172[17] Valente T,Galliano F P. Corrosion resistance properties of reactive plasma-sprayed titanium composite coatings[J].Surface and Coatings Technology,2000,127(1):86-92[18] 冯文然，阎殿然，何继宁，等。反应等离子喷涂纳米TiN涂层的显微硬度及微观结构研究[J].物理学报，2005，54（5）：2399－2402[19] 解正国，石铭德，庄谨。空心阴极放电离子镀法沉积氮化钛涂层[J]. 清华大学学报(自然科学版),1995,35(2):103-108[20] 杨武保，范松华，刘赤子，等。脉冲高能量密度等离子体法类金刚石膜的制备及分析[J]. 物理学报，2003, (52) :140- 144[21] Liu B, Zhang J Z, Chen H F, et al. Investigation of titanium coating on Si3N4 by using a pulsed high energy density plasma (PHEDP) gun[J]. Materials Chemistry and Physics, 1999,(57):219-223[22] 刘元富，张谷令，王久丽，等。脉冲高能量密度等离子体法制备TiN薄膜及其摩擦磨损性能研究[J].物理学报，2004, 53(2) :503- 507[23] 吴成，江德仪， 袁定朴，等。脉冲送气等离子体强的实验[J] .核聚变与等离子体物理，1989, 9(3) :178- l83[24] 闫鹏勋，杨思泽，李兵，等。用高能量密度等离子体在室温下制备氮化钛薄膜[J] .通报科学1994, 39(17): 1547- 1549 [25] Yan P X, Yang S Z, Li B, et a1. A new technique for deposition of titanium carbonitride films at room temperature by high energy density pulse plasma[J]. Nuclear Instrument and Methods in Physics Research, 1995, 95: 55-58.[26] 梁忠友。热等静压技术在特种陶瓷制备中的应用[J] . 陶瓷， 1999, (1) : 39[27] William Sproul. PVD Today[J]. Cutting Tool Engineering, 1995, (3): 44[28] Zackrisson J, Rolander U, Weinl G, et al. Microstructure of the surface zone in a heat-treated cermet material[J]. Int J Refr Met Hard Mater. 1998, (16): 315[29] 张通和，吴瑜光.离子束技术在工业中的应用[J] . 机械工人:热加工，2004(7) : 9- 13
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