Abstract：In this paper, Cu target and Al target were used as targets, different amount of Cu sheets were pasted on the Al target to control the Cu/Al ratio, and Cu-Al-O films were deposited on the glass substrate by RF magnetron sputtering. The effects of Al content on the composition, crystal structure and photoelectric properties of the films were analyzed by WDS, XRD, XPS, four-point probe, Hall effect and UV-Vis spectrum. The results show that the Al content of the film increases from 0 to 19.35% with the increase of Cu flakes; the crystal structure of the film changes from CuO phase to amorphous state with the increase of Al content; the resistivity increases from 0.49 Ω·cm to 11.78 Ω·cm with the increase of Al content; the Cu-Al-O film is p-type; the visible light transmittance increases from 19.98% to 74.11% with the increase of Al content, and the optical energy gap increases from 2.09 eV to 2.88 eV. steel used Plasma cladding technology using Fe310 ferrobased self-fused alloy powder + TiC powder as cladding material. At the addition ratio of 3 %, 6 %, and 10 % of TiC, the phase composition and microstructure of the cladding layer were analyzed by means of scanning electricity and X-ray diffraction experiments. The microhardness and wear resistance of the cladding layer were measured by microhardness meter and friction wear tester，The results show that the combination between the cladding layer and the matrix is metallurgical; The highest hardness of cladding layer is up to 1 643HV0.5, is 6.3 times of the substrate. The relative wear resistance is 5.8 times of the substrate.
2020, Vol. 30 
