|
|
|
| Effect of sputtering power on the properties of Zr51Al11Ni4Cu34 amorphous alloy
films for medical device by DC magnetron sputtering |
| GE Hongyang，WANG Yongle |
| School of information engineering，Xuchang vocational and technical college，Xuchang 461000，China |
|
|
|
|
Abstract The amorphous alloy films using Zr51Al11Ni4Cu34 alloy as single target were prepared on glass substrate
by DC magnetron sputtering，and the effects of sputtering power on microstructure，mechanical property and electrical
property were analyzed by XRD，SEM，nano- indentation tester and four point probe tester. The results
show that all the films are amorphous and gain the highest degree of amorphization at 100W，and there are still obvious
cracks at 200 W. The hardness and elastic modulus of films are not obviously changed with the increasing of
sputtering power，the hardness is 459-510HV and the elastic modulus is 90-94 GPa. The resistivity of films decreases
from 7.05×10－3 to 1.09×10－3 Ω·cm with the increasing of sputtering power.
|
|
Received: 13 March 2020
|
|
|
|
|
|
|
2020, Vol. 30 
