Abstract:Ultra- thin Fe3O4 films with single crystal structure have been prepared by magneto sputtering method, and the effect of film thickness (3~30 nm) on magnetic properties was systematically investigated X ray diffraction results show that the Fe3O4 films grow along (220) crystal direction, and the full width at half maximum for (220) peak of Fe3O4 films becomes wider and wider with the film thickness decrease Magnetization curves were clearly observed and the saturated magnetization intensity can be 400×103 A/m The measurement of resistivity at low temperature confirms the Verwey transition from conductivity to insulator at around 120 K It is seen that the surface roughness of Fe3O4 film is very low measured by atomic force microscopy, which indicate the Fe3O4 film is suitable for the development of nano- scaled spin electronic devices.
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