Abstract：This paper aims at the disadvantages of low capacity density and narrow electrochemical window of conventional nickel-hydrogen batteries，combined with the excellent hydrogen storage performance of silicon materials, the amorphous silicon (a-Si) and hydrogenated amorphous silicon (a-Si：H) films were prepared by RF magnetron sputtering and post-gas hydrogenation as anode materials for Ni-MH batteries. The structure of amorphous silicon films and their electrochemical properties in proton ionic liquids were studied by XRD、TEM、XPS、SEM、EDS and electrochemical measurements. The results show that the silicon thin films prepared by sputtering are amorphous, and the silicon-nickel compound phase is formed at the interface between the silicon thin films and the nickel substrate. Moreover, the amorphous silicon film has some degree of oxidation during sputtering. After gas hydrogenation treatment, silicon and hydrogen form SiH、SiH2 and SiH3 three bonding modes in amorphous silicon films, accompanied by a small amount of amorphous silicon crystallization, the film has a certain degree of exfoliation, and the oxidation is aggravated. The electrochemical test analysis shows that the discharge capacity of the sputtered amorphous silicon thin film electrode is very low (113 mAh·g-1), and the electrochemical performance of the amorphous silicon thin film after gas hydrogenation is significantly improved. When the gas hydrogenated time is 30 min, the film electrode has a maximum discharge capacity of 480 mAh·g-1, and its capacity is still not attenuated after 20 cycles of charge and discharge.
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2021, Vol. 28 