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Influence of substrate temperature on magnetic properties of low coercivity Fe-Si thin film |
LI Tongkui1,2,ZHOU Chunxia1,2,YAN Pengfei2,3,YAN Biao1,2 |
1School of Materials Science and Engineering, Tongji University, Shanghai 200000, China;2Shanghai key Laboratory for D&A of Metal functional Materials, Shanghai 200000, China;3School of Physics and Engineering, Tongji University, Shanghai 200000, China |
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Abstract In this paper, Low coercivity soft magnetic films were obtained by DC magnetron sputtering at different temperatures. When the substrate temperature is higher than 140 ℃, Si in the substrate diffuses into the film, the magnetic moment of the film is diluted, the coercivity increases and the saturation magnetization decreases. The results of VSM show that the coercivity decreases first and then increases with the increase of substrate temperature. When the substrate temperature is 140 ℃, the soft magnetic properties of the sputtered Fe-Si films are better. The coercivity Hc reaches the lowest value of 1 Oe and the saturation magnetization Ms is 716 emu/cm3. The initial magnetization curve shows that when the applied magnetic field is 20 Oe, the magnetization is 670 emu/cm3 and the susceptibility is 421.5.
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Received: 10 May 2020
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