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| Study on the preparation process of Al-doped-ZnO (AZO) ceramic target |
| TANG Peixin，Lü Zhoujin，CHE Lida，WU Zhanfang |
| （CISRI HIPEX Technology Co., Ltd., Beijing 100081, China） |
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Abstract The AZO target is an alloy target of transparent conductive zinc oxide that exhibits excellent conduc‐
tivity and transparency, which has wide application in various fields, including solar cells, liquid crystal displays,
and optoelectronic devices. In this paper, Al-doped-ZnO (AZO) ceramic target was prepared by powder mixing+
cold isostatic pressing+non-pressure sintering. The mixed powder was obtained by ball milling and spray drying.
The effects of different sintering temperatures on the properties of AZO ceramic targets were studied, and the op‐
timal process parameters were determined. The results show that the AZO target with excellent properties can be
prepared by spray drying powder + cold isostatic pressing + non-pressure sintering at 1 300 ℃, in which the den‐
sity is 99%, average grain size is 20 μm, resistivity is 10-3 Ω·cm, and contains a small amount of ZnAl2O4 phase.
The hot isostatic pressing experiment find that hot isostatic pressing can increase the density of the sintered billet
from 97.2% to 100%, reaching the theoretical density. The ultra-high density target material can withstand higher
power, long-term sputtering without cracking, and can significantly improve sputtering efficiency.
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Received: 10 October 2022
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Corresponding Authors:
吕周晋（1983—），男，硕士，主要研究方向为热等静压技术及应用等。
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2023, Vol. 33 
