Effect of sputtering power on the properties of Zr51Al11Ni4Cu34 amorphous alloy
films for medical device by DC magnetron sputtering

GE Hongyang; WANG Yongle

doi:10.13228/j.boyuan.issn1006-6543.20200058

Effect of sputtering power on the properties of Zr51Al11Ni4Cu34 amorphous alloy films for medical device by DC magnetron sputtering

GE Hongyang，WANG Yongle

Powder Metallurgy Industry ›› 2020, Vol. 30 ›› Issue (06) : 65-68.

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Powder Metallurgy Industry ›› 2020, Vol. 30 ›› Issue (06) : 65-68. DOI: 10.13228/j.boyuan.issn1006-6543.20200058

Effect of sputtering power on the properties of Zr51Al11Ni4Cu34 amorphous alloy films for medical device by DC magnetron sputtering

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2020, 30(06): 65-68 https://doi.org/10.13228/j.boyuan.issn1006-6543.20200058

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Received	Published
2020-03-13	2020-12-10
Issue Date
2020-12-10

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