磁控溅射钛靶材的发展概述
董亭义 ，万小勇 ，章程，何金江，吕保国
The present status and development trend of magnetron sputtering Ti target
DONG Ting- yi,,, WAN Xiao- yong,, ZHANG Cheng, HE Jin- jiang, L Bao- guo,
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2017, (5): 57
-62
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DOI: 10. 13228/j. boyuan. issn1005- 8192. 2017028
