溅射功率对直流磁控溅射微机电制造用Zr51Al11Ni4Cu34非晶
合金薄膜特性的影响
葛洪央，王永乐
Effect of sputtering power on the properties of Zr51Al11Ni4Cu34 amorphous alloy
films for medical device by DC magnetron sputtering
GE Hongyang，WANG Yongle
粉末冶金工业
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2020, (06): 65
-68
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DOI: 10.13228/j.boyuan.issn1006-6543.20200058
